Structural and optical properties of copper and nickel oxynitride films [Elektronische Ressource] / vorgelegt von Fahri Uslu

Sujets

• Physik

Informations

• Publié par: rheinisch-westfalischen_technischen_hochschule_-rwth-_aachen
• Publié le: 01 janvier 2008
• Nombre de lectures: 12
• Langue: English
• Poids de l'ouvrage: 14 Mo

Extrait

Structural and optical properties of copper- and
nickel-oxynitride films


Von der Fakultät für Mathematik, Informatik und Naturwissenschaften der
RWTH Aachen University zur Erlangung des akademischen Grades
eines Doktors der Naturwissenschaften genehmigte Dissertation


vorgelegt von

Diplom- Physiker
Fahri Uslu

aus Sivas, Türkei


Berichter: Universitätsprofessor Dr. Matthias Wuttig
Universitätsprofessor Dr. Dieter Mergel


Tag der mündlichen Prüfung: 13. August 2008



Diese Dissertation ist auf den Internetseiten der Hochschulbibliothek online
verfügbar





Chapter 1: Introduction .....................................................................................................6

Chapter 2: Principles of Sputtering and Film Growth.....................................................11

2.1 The sputtering process......................................................................................12
2.1.1 The dc magnetron sputtering process...................................................13
2.1.2 The sputtering discharge ......................................................................14
2.1.3 The sputter yield...................................................................................15
2.1.4 Energy distribution of sputtered atoms ................................................17
2.1.5 Reactive sputtering...............................................................................18
2.2 Film growth......................................................................................................20
2.3 Residual stress.................................25

Chapter 3: Experimental methods and procedures......28

3.1 The sputtering system.......................................................................................29
3.2 Plasma analysis: The Langmuir probe .............................................................29
3.3 X-ray analysis...................................................................................................31
3.3.1 Bragg’s law ..........................................................................................31
3.3.2 The intensity of the diffraction peak ....................................................33
3.3.3 Diffraction geometries..........................................................................38
3.3.4. Microstructural features obtained by X-ray diffraction ......................41
3.3.5 X-Ray Reflectometry ...........................................................................43
3.3.6 Strain analysis by X-ray diffraction .....................................................46
3.3.7 The X-ray setup....................................................................................49
3.4 Transmission electron microscopy...................................................................50
3.4.1 The electron microscope ......................................................................51
3.4.2 Electron diffraction and imaging modes in TEM.................................53
3.4.3 Contrast in TEM...................................................................................58
3.4.4 The experimental setup and sample preparation ..................................58
3.5 Ellipsometry .....................................................................................................60

2



Chapter 4: Results........................................................................................................... 65

4.1 Properties of copper oxide films............................................................................... 66
4.1.1. Introduction.................................................................................................. 66
4.1.2 Experimental procedure................................................................................ 67
4.1.3 Results and discussion .................................................................................. 68
Target characteristics ............................ 68
Stoichiometry and crystallographic phases................................................... 70
Deposition characteristics............................................................................. 77
Residual Stress.............................................................................................. 79
Transmission electron microscopy: The microstructure............................... 83
Electrical and optical properties ................................................................... 86
4.1.4 Summary........................................................................................................ 90

4.2 Film properties and correlation between plasma parameters and grain orientation in
reactively sputtered copper-nitride films ........................................................................ 93
4.2.1. Introduction.................................................................................................. 94
4.2.2 Experimental procedure................................................................................ 95
4.2.3 Results........................................................................................................... 96
Plasma analysis ..................................... 96
Film structure and composition .................................................................... 99
Electrical and optical properties ................... 104
4.2.4 Discussion................................................................................................... 106
4.2.5 Summary..................................................................................................... 110

4.3 Structural and optical properties of copper-oxynitride films.................................. 112
4.3.1 Introduction.................................. 112
4.3.2 Experimental procedure.............................................................................. 112
4.3.3 Results and Discussion....................................................... 113
Structural properties.................................................................................... 113
Electrical and optical properties ................................................................. 124
3

4.3.4 Summary .....................................................................................................127
4.4 Properties of nickel-oxide films ..............................................................................129
4.4.1 Introduction ..................................129
4.4.2 Experimental procedure ..............................................................................129
4.4.3 Results and Discussion........................................................130
Structural properties ....................................................................................130
Target and deposition characteristics ..........................................................132
Electrical and optical properties..................................................................134
4.4.4 Comparison with copper-oxide.................................................139
4.4.5 Summary .....................................................................................................139

4.5 Properties of nickel-nitride films.............................................................................141
4.5.1 Introduction ..................................141
4.5.2 Results and Discussion................................................................................142
Structural properties ....................................................................................142
Deposition characteristics ...........................................................................143
Optical and electrical properties..................................................................144
4.5.3 Comparison with copper-nitride..................................................................145
4.5.4 Summary .....................................................................................................146

4.6 Formation of tetragonal nickel nitride by means of reactive sputtering in an argon -
nitrogen - oxygen discharge ..........................................................................................148
4.6.1. Introduction ................................................................................................149
4.6.2. Experimental details...................................................................................149
4.6.3. Results ......................................151
Atomic composition ....................................................................................151
Structure of Ni N- films ..............................................................................151 x
Residual stress.............................................................................................159
4.6.4 Discussion ...................................................................................................159
4.6.5 Comparison with copper-oxynitride for low oxygen concentrations.....