Next-generation nanoimprint lithography [Elektronische Ressource] : innovative approaches towards improving flexibility and resolution of nanofabrication in the sub-15-nm region / by Stefan Harrer
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Next-generation nanoimprint lithography [Elektronische Ressource] : innovative approaches towards improving flexibility and resolution of nanofabrication in the sub-15-nm region / by Stefan Harrer

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Publié par
Publié le 01 janvier 2008
Nombre de lectures 41
Poids de l'ouvrage 168 Mo

Extrait

Institut für Nanoelektronik
Technische Universität München

Next-Generation Nanoimprint Lithography: Innovative
Approaches Towards Improving Flexibility And
Resolution Of Nanofabrication In The Sub-15-nm Region

Stefan Harrer

Vollständiger Abdruck der von der Fakultät für Elektrotechnik und Informationstechnik der
Technischen Universität München zur Erlangung des akademischen Grades eines
Doktor-Ingenieurs
genehmigten Dissertation.



Vorsitzender: Univ.-Prof. Dr. techn. Peter Russer
Prüfer der Dissertation: 1. Univ.-Prof. Paolo Lugli, Ph.D.
2. Univ.-Prof. Dr. Gerhard Abstreiter



Die Dissertation wurde am 27. Februar 2008 bei der Technischen Universität München
eingereicht und durch die Fakultät für Elektrotechnik und Informationstechnik am 2. Juli
2008 angenommen.
Univ.
dvisor
Appr
f
:
Next-Genera
rl
T
t
o
date:
P
Ka
I
h
A
Inno
(TUM)
Nano
BSc.
to
qu
Quan
degree
Resolution
2008
tec
sub-15-nm
Examiner
Lugli
aolo
K.
Gerhard
Institute
P
Nanoimprint
Prof.
Institute
Münc
a
y
ersität
n
a
partial
hnology
the
ards
en
Prof.
r
Flexibility
Doktor-Ingenieur
Nanostructures
ebruary
Nanof
t
Prof.
in
Dr.
Prof.
Russer
Dissertation
submitted
(TUM)
Dr.
rl
(TUM)
Massac
Prof.
Berggren
(TUM)
Univ
Prof.
tion
Lugli
usetts
I
Lithography:
K
for
Berggren
v
hen
of
b
tive
Dipl.-Ing.
hnisc
Stefa
o
Harrer,
ec
in
ches
fulllmen
electronics
of
w
re
(MIT)
irem
Impr
ts
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o
ving
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tum
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and
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of
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and
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eter
Region
(TUM)
Dr.
I
Prof.
ec
he
hen
P
Nanofabrication
t
examination
to
P
the
Lugli
F
Examiner
akultät
I:
für
Dr.
Elektrotec
Abstreiter
hnik
A
und
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I
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nformationstec
aolo
hnik
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at
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