Modelling and fabrication of high performance Schottky barrier SOI-MOSFETs with low effective Schottky barriers [Elektronische Ressource] / Forschungszentrum Jülich in der Helmholtz-Gemeinschaft, Institute of Bio- and Nanosystems. Min Zhang
108 pages
English

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Modelling and fabrication of high performance Schottky barrier SOI-MOSFETs with low effective Schottky barriers [Elektronische Ressource] / Forschungszentrum Jülich in der Helmholtz-Gemeinschaft, Institute of Bio- and Nanosystems. Min Zhang

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108 pages
English
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Forschungszentrum Jülichin der Helmholtz-GemeinschaftInstitute of Bio- and NanosystemsModelling and fabrication of high performanceSchottky-barrier SOI-MOSFETs with loweffective Schottky-barriersMin ZhangJül-4235Dezember 2006ISSN 0944-2952Jül-4235 Min Zhang Label-free dectection of biomoleculesJül-4235Berichte des Forschungszentrums Jülich 4235Modelling and fabrication of high performanceSchottky-barrier SOI-MOSFETs with loweffective Schottky-barriersMin ZhangBerichte des Forschungszentrums Jülich ; 4235ISSN 0944-2952Institute of Bio- and NanosystemsD 82 (Diss., RWTH Aachen, 2006)Zu beziehen durch: Forschungszentrum Jülich GmbH, • Zentralbibliothek, VerlagD-52425 Jülich • Bundesrepublik Deutschlandin 02461/61-5220 • Telefax: 02461/61-6103 • e-mail: zb-publikation@fz-juelich.deContents1 Introduction 12 Principles of SB-MOSFETs 42.1 The SB-MOSFET 42.2 The MOS-capacitor 62.3 Schottky diodes 92.4 Schottky diode current 112.5 Operating principles of SB-MOSFETs 132.6 I-V characteristics of SB-MOSFET devices 152.6.1 Long-channel SB-MOSFET 152.6.2 Short-channel SB-MOSFET 182.6.3 SB-MOSFESTs on bulk versus on SOI 203 Silicide in SB-MOSFET 223.1 Silicidation of NiSi 233.1.1 NiSi films on Si(100) 253.1.2 NiSi films on SOI(100) 263.2 Silicidation induced dopant segregation 283.

Informations

Publié par
Publié le 01 janvier 2006
Nombre de lectures 17
Langue English
Poids de l'ouvrage 5 Mo

Extrait

Forschungszentrum Jülich
in der Helmholtz-Gemeinschaft
Institute of Bio- and Nanosystems
Modelling and fabrication of high performance
Schottky-barrier SOI-MOSFETs with low
effective Schottky-barriers
Min Zhang
Jül-4235
Dezember 2006
ISSN 0944-2952
Jül-4235 Min Zhang Label-free dectection of biomolecules
Jül-4235Berichte des Forschungszentrums Jülich 4235
Modelling and fabrication of high performance
Schottky-barrier SOI-MOSFETs with low
effective Schottky-barriers
Min ZhangBerichte des Forschungszentrums Jülich ; 4235
ISSN 0944-2952
Institute of Bio- and Nanosystems
D 82 (Diss., RWTH Aachen, 2006)
Zu beziehen durch: Forschungszentrum Jülich GmbH, • Zentralbibliothek, Verlag
D-52425 Jülich • Bundesrepublik Deutschland
in 02461/61-5220 • Telefax: 02461/61-6103 • e-mail: zb-publikation@fz-juelich.deContents
1 Introduction 1
2 Principles of SB-MOSFETs 4
2.1 The SB-MOSFET 4
2.2 The MOS-capacitor 6
2.3 Schottky diodes 9
2.4 Schottky diode current 11
2.5 Operating principles of SB-MOSFETs 13
2.6 I-V characteristics of SB-MOSFET devices 15
2.6.1 Long-channel SB-MOSFET 15
2.6.2 Short-channel SB-MOSFET 18
2.6.3 SB-MOSFESTs on bulk versus on SOI 20
3 Silicide in SB-MOSFET 22
3.1 Silicidation of NiSi 23
3.1.1 NiSi films on Si(100) 25
3.1.2 NiSi films on SOI(100) 26
3.2 Silicidation induced dopant segregation 28
3.3 Lateral silicidation of NiSi on SOI 30
4 Modelling of SB-MOSFET operation 33
4.1 Model of device simulation 33
4.2 Simulation results 34
4.2.1 A 30nm device 34
4.2.2 Gate oxide thickness 37
4.2.3 Silicon body thickness 39
4.2.4 Dopant segregation 39
4.3 Results and discussion 42
5 Schottky diodes 44
445.1 Fabrication of Schottky diodes

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