The Finite Integration Technique (FIT) and the Application in Lithography Simulations [Elektronische Ressource] / Zhabiz Rahimi. Betreuer: Andreas Erdmann

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The Finite Integration Technique (FIT) andthe Application in Lithography SimulationsDer Technischen Fakult at derFriedrich-Alexander-Universit atErlangen-Nurn bergzur Erlangung des GradesD O K T O R - I N G E N I E U Rvorgelegt vonZhabiz RahimiErlangen, 2011Die Finite Integrationstechnik (FIT) und dieAnwendung in der Lithographie-SimulationDer Technischen Fakult at derFriedrich-Alexander-Universit atErlangen-Nurn bergzur Erlangung des GradesD O K T O R - I N G E N I E U Rvorgelegt vonZhabiz RahimiErlangen, 2011Als Dissertation genehmigt vonder Technischen Fakult at derUniversit at Erlangen-Nurn bergTag der Einreichung: 10. Januar 2011Tag der Promotion: 08. M arz 2011Dekan: Prof. Dr. R. GermanBerichterstatter: PD. Dr. Andreas ErdmannZweitberichterstatter: Prof. Dr. Christoph P aumAbstractRigorous electromagnetic eld (EMF) simulation of light di raction from optical lithography masks has becomea standard requirement for the optimization of lithographic processes. Firstly, due to an increasing requirementfor enhanced image resolution. Secondly, because of the ongoing miniaturization of electronic circuits wherefeature sizes are in the order or smaller than the wavelength of light used in the projection imaging system.Lithographic masks are produced by various processes, some of which produce complex shapes with some surfaceroughness on the mask. These shapes a ect both light scattering and image formation.

Informations

• Publié par: friedrich-alexander-universitat_erlangen-nurnberg
• Publié le: 01 janvier 2011
• Nombre de lectures: 26
• Langue: English
• Poids de l'ouvrage: 19 Mo

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